Magetron Sputtering Machine
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Vacuum thin film magnetron sputtering coatingng machine
Vacuum magnetron sputtering technique is the use of the female, bipolar electrode surface with the magnetic field of the electron in the cathode surface drift, by setting the target surface electric field perpendicular to the magnetic field, the electron increases stroke, increase the rate of ionization of the gas, while the high-energy particles gas and lose energy after the collision and so lower substrate temperature, complete coating on a non-temperature resistant material.
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Vacuum deposition magnetron sputtering system
Vacuum deposition magnetron sputtering system is a kind of vacuum equipment which can be used for applying thin film coating layers on different raw material with metallic or functional coatings.
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Magnetron sputtering coating machine for plastic disposable cutleries
Magnetron sputtering is a widely used thin film deposition technology at present. With the continuous development of sputtering technology and the exploration of new functional films, the application of magnetron sputtering has been extended to many fields of production and scientific research. As a non-thermal coating technology in the field of microelectronics, it is mainly used in chemical vapor deposition (CVD) or metal organic chemical vapor deposition (MOCVD) to deposit thin films of materials that are difficult to grow and unsuitable, and can obtain very uniform thin films in large areas.
